Manufacturing Processes II Mock Test 3

1. Post-treatment starts with a thermal treatment of the MpSi structure at _____

2. The etching rate is also affected by the diffusion of by-products.

3. Metal-assisted etching can produce pSi structures with high surface-to-volume ratio.

4. The resulting pore structure in pSi is intrinsically dependent on the doping level of the Si wafer.

5. Structural features of metal-assisted etched pSi are different for different oxidant.

6. In the pore formation mechanism of MpSi, electronic holes initiate the dissolution process of silicon.

7. Electronic holes in metal-assisted etching of porous silicon oxidise silicon atoms.

8. According to morphological details, pSi can be divided as sponge-like pSi and pSi featuring cylindrical pores.

9. Roughness of the hydrophobic surfaces formed after dipping silicon in HF solution is dependent on the type of etchant.

10. Geometric features of the pSi structure are determined by noble metal mask.